Deposition rate

The deposition rate was decreased with increased of the temperature .

沉积速率随温度的增加而减少；

Effects of composition in solution and process conditions on deposition rate were studied .

研究了镀液组成及操作条件对沉积速率的影响。

It showed that in the deposition rate range of 30 ~ 90 (?)

结果表明，在沉积速率高达30～90（？）

Study on the Stability and Deposition Rate of Electroless Copper Plating

影响化学镀铜溶液稳定性和沉铜速率的因素

The deposition rate increases with the increasing of bias voltage pressure .

类金钢石薄膜的沉积速率随极板负偏压、体工作压力的增加而增大。

With increase of current density , both deposition rate and corrosion resistance increased ;

随着电流密度的增加，沉积速率和耐蚀性增加，而共析量先增加后下降；

Factors Affecting the Copper Deposition Rate on Carbon Fiber

影响碳纤维表面镀铜速率的因素

Factors Affecting the Stability and Deposition Rate of Electroless Copper

影响化学镀铜液稳定性和镀速的因素

Deposition rate is increase quickly with sputtering power .

结果表明溅射功率对沉积速率的影响最大，随溅射功率的增大沉积速率快速增大。

The influence of sampling methods on test result of chloride deposition rate in marine environment

采集方法对氯化物沉积速率测试结果的影响

Quantitative Model of Soil Deposition Rate Constructed by Using ~ ( 137 ) Cs

基于~（137）Cs的土壤沉积速率的定量模型

Influence of Laser Beam Spot Size on Vapour Phase Photo deposition Rate

激光束斑点尺寸对汽相光淀积率的影响

Dependence of Electrical Properties of CdS Films on the Deposition Rate

CdS膜沉积速率与电学性质关系的研究

Study of deposition rate equation of sio_2 film by direct photo CVD method

直接光CVDSiO2膜沉积速率的研究

With increasing oxygen flow ratio of argon , deposition rate gradually decreased .

随着氧氩流量比的增大薄膜沉积速率在逐渐减小。

Distribution of Cr film deposition rate for ion beam sputtering

离子束溅射淀积铬薄膜沉积速率的分布

Effect of Technical Parameters on Deposition Rate of CVD ZnS

工艺参数对CVDZnS沉积速率的影响

The influences of temperature on phase composition , microstructure and deposition rate were studied .

研究温度对涂层的物相组成、微观结构和沉积速率的影响。

Influence of Operation Conditions on Deposition Rate of Planar DC Magnetron Sputtering

工作参数对平面磁控溅射系统沉积速率的影响

Research on thin film deposition rate deposited by sputtering

溅射镀成膜速率的研究

Concentration of plating solution obviously affects the deposition rate and cohesion .

镀液浓度影响镀层的沉积速率及结合力。

The sputtering deposition rate and target utilization are more concerned during the production process .

生产过程中比较关注溅射镀膜时的沉积速率、靶材的利用率等因素。

The deposition rate is dropped as pressure in the reaction chamber is increased .

沉积速率随着反应室工作压力的增加而下降。

Effects of citric acid on electroless Ni-P alloy deposition rate and properties

柠檬酸对Ni-P合金化学镀沉积速度和镀层性能的影响

The Effects of Fluorine on Deposition Rate and Efficiency in MCVD Process

光纤制备过程中掺氟对沉积速率及沉积效率的影响

Device quality microcrystalline Si Films by RF-PECVD with high deposition rate

射频PECVD高速沉积优质微晶硅薄膜

The influence of substrate temperature and working pressure on the film deposition rate was not significant .

衬底温度与工作气压对薄膜沉积速率的影响并不显著。

Deposition rate is an important parameter in magnetron sputtering and influenced by many factors .

沉积速率是磁控溅射镀膜技术中的一项重要指标，它由许多因素决定。

Deposition Rate of IBS Deposited Pt Films at Different Substrate Temperatures

离子束溅射铂膜沉积速率的温度效应

Effects of power supply mode on deposition rate in middle-frequency magnetron sputtering

电源工作模式对中频磁控溅射沉积速率的影响