tetramethylsilane

During the deposition of nanocrystalline silicon carbide films , with the increase of tetramethylsilane concentration in the reactive gas source , the crystal structure of silicon carbide whose grain size decreases changes from hexagonal to cubic and the particle shape changes from spherical to cauliflower-like .

在制备纳米碳化硅薄膜的沉积过程中，随着四甲基硅烷浓度的增大，纳米碳化硅晶体结构由六方转变为立方结构，颗粒形状由球状变为菜花状。

UV Laser MPI Spectra and TOF Mass Spectra of Tetramethylsilane

紫外激光作用下四甲基硅的MPI光谱和TOF质谱研究

Multiphoton ionization spectrum and mass measurement of tetramethylsilane

四甲基硅的多光子电离光谱和质谱

Multiphoton Ionization and Dissociation of Tetramethylsilane at 410 ~ 373 nm Laser Radiation

410～373nm激光作用下四甲基硅的多光子电离与解离

Violet ( ultraviolet ) laser MPI of tetramethylsilane and resonant ionization of silicon atom

紫（外）激光作用下Si（CH3）4的MPI与Si原子的共振电离

Spectrum study on Tetramethylsilane Multiphoton Ionization

四甲基硅多光子电离的光谱研究

Multiphoton ionization ( MPI ) mass spectra distributions of tetramethylsilane in gaseous phase are investigated using a quadrupole mass spectrometer and a pulsed molecular beam at 355 nm laser radiation .

在355nm的激光作用下，利用扩散分子束技术和四极质谱装置相结合研究了气相Si（CH3）4分子多光子电离（MPI）质谱分布。

Multiphoton dissociation ( MPD ) of tetramethylsilane and two photon resonance three photon ionization of silicon atoms are studied with parallel plate vacuum cell at violet laser radiation in the wavelength range 410 ~ 404nm .

在410～404nm的紫激光作用下，利用平行板电极装置研究了Si（CH3）4的多光子解离（MPD）及Si原子的双光子共振三光子电离。

On the structural studies of porphyrin compounds , chemical ionization mass spectrometry using mixture of tetramethylsilane and methane as reagent gas provide information about [ M + 73 ] ~ + ions and the results as the limitations of the method are described .

四甲基硅烷作反应气的化学电离质谱对卟啉的分析能提供有关[M+73]~+离子和分子结构的信息。本文研究了该方法的实验条件、分析结果和局限性。