三氯化硼

本文采用三氯化硼作反应试剂，研究一种新的蚀刻二氧化锡薄膜工艺.此工艺可以蚀刻1.5μm的线条，其分辨率好且精度高。

Boron trichloride has been used in a new process for etching stannic oxide films ( non-isothermal plasma ) which is capable of etching 1.5 micron lines with excellent resolution and high precision .

介绍了化学比色法测定三氯化硼中微量氯的过程及消除基体干扰的方法。

The article introduce the method that using wet chemical to detect chlorine in boron trichloride , and how to clear the disturbance of boron trichloride .

CO2激光辐照三氯化硼-溴丙烷体系

The system of boron trichloride and 1-bromopropane under CO_2 laser irradiation

三氯化硼中硼同位素天然丰度比的红外光谱测定

Determination of natural fractional isotope abundance ratio of boron in boron trichloride by infrared spectroscopy

三氯化硼红外多光子吸收分离硼同位素过程中氟氯化硼的生成

The formation of boron fluoro-chloride in the separation of boron isotopes by multiphoton absorption of BCl_3