磁控溅射法

RF磁控溅射法原位制备C轴择优取向ZnO薄膜

In Situ Deposition of C-axis Oriented ZnO Thin Films by RF Magnetron Sputtering

Si衬底上磁控溅射法生长MgO薄膜

Growth of MgO thin films on Si substrates by magnetron sputtering

磁控溅射法沉积SiNx非晶薄膜的生长机制及结构分析

Deposition and Structures Analysis of Amorphous SiN_x Films Prepared by Magnetron Sputtering

蓝宝石衬底上磁控溅射法室温制备外延ZnO薄膜

Room Temperature Epitaxial Growth of ZnO Thin Film on Sapphire Substrates by RF Magnetron Sputtering

用直流反应磁控溅射法在浮法玻璃基片上制备了TiN薄膜。

Thin films of TiN were deposited on float glass substrates by DC reactive magnetron sputtering .

磁控溅射法沉积TiO2低辐射膜及AFM分析

AFM Analysis on TiO_2 Low-E Thin Films Deposited by Magnetron Sputtering

通过XRD测量以及光学特性分析比较得出采用孪生对靶溅视比平面磁控溅射法优越。

XRD and optical characteristic represented that the twinborn targets was better that plane magnetic DC sputtering .

本文采用直流反应磁控溅射法分别在P型Si（111）基底和玻璃基底上沉积AlN薄膜。

AlN thin films were deposited by DC magnetron reactive sputtering on p-Si ( 111 ) and glass substrates .

用磁控溅射法在Si基底上制备了不同调制波长的SiC／W纳米多层膜。

The nano-laminated SiC / W films with different alternative lengths , d , were prepared by magnetron sputtering .

射频磁控溅射法生长MgxZn（1-x）O薄膜的结构和光学特性

Structural and optical properties of Mg_xZn_ ( 1-x ) O thin films deposited by radio frequency magnetron sputtering

用磁控溅射法（RMS）制备了SiC微晶薄膜，并对其进行了退火处理。

Microcrystal SiC films were prepared by RF-magnetron sputtering technique ( RMS ) and then annealed .

射频磁控溅射法低温制备ZnO∶Zr透明导电薄膜及特性研究

Growth and Properties of Transparent Conducting ZnO ∶ Zr Films by RF Magnetron Sputtering at Low Temperatures

另外一种方法是以N2为掺杂源的直流反应磁控溅射法。

The other is DC reactive magnetron sputtering with N2 as dopant source .

退火温度对射频磁控溅射法生长的Mg（0.16）Zn（0.84）O薄膜性质的影响

The influence of annealing temperature on properties of Mg_ ( 0.16 ) Zn_ ( 0.84 ) Ofilms deposited by radio frequency magnetron sputtering

同磁控溅射法相比，热蒸发法在不掺杂的情况下，不仅制备出了具有n型导电特性的CuO薄膜，而且制备出了具有p型导电特性的CuO薄膜。

Comparing with magnetron sputtering , thermal evaporation can fabricate both n-type and p-type conducting CuO thin films without being doped .

本文选用纯度为99.999%的β-Ga2O3粉末为源材料制成陶瓷靶，在低温下采用射频磁控溅射法在Si（111）和石英衬底上直接淀积氧化镓薄膜。

In the paper , β - Ga_2O_3 power of 99.999 % purity was used as the source material for ceramics target .

用磁控溅射法在Ar＋N2混合气氛中制备了性能优异的具有纳米结构的Fe－Ta－N软磁薄膜。

Excellent soft magnetic nanostructure Fe Ta N films were fabricated in Ar + N 2 mixed gas by magnetron sputtering method .

采用射频磁控溅射法成功制备了HA（+ZrO2+Y2O3）/Ti6Al4V生物复合涂层。

HA ( + ZrO-2 + Y-2O-3 ) / Ti6Al4V composite coatings have been fabricated successfully by radio frequency magnetron sputtering technique .

本文采用直流磁控溅射法溅射掺铌Nb的ITO靶来制备掺铌ITO膜。

The niobium-doped ITO film was prepared by the direct current magnetron sputtering method through sputtering the niobium-doped target .

射频磁控溅射法分别制备PZT和BST铁电薄膜的分析与比较

Analysis and Comparison on Preparation of PZT and BST Thin Films by RF - Magnetron Sputtering

采用非平衡磁控溅射法在316L不锈钢制成的血管支架表面制备Ti以及TiO2薄膜，初步研究了Ti薄膜厚度、TiO2薄膜沉积速率对薄膜在血管支架表面附着状况的影响。

In this paper the adhesion of Ti and TiO_2 films deposited on 316L stainless steel stent by unbalanced magnetron sputtering were studied .

采用溶胶凝胶法、粉末涂敷法和磁控溅射法在导电玻璃上制得纳米TiO2薄膜。

Nanocrystalline TiO2 films were prepared by sol - gel method , powder - coating method and magnetic sputtering .

本文采用磁控溅射法在本征Si（100）上制备Fe掺杂ZnO薄膜，分析研究了溅射时间、溅射工作气压和铁元素掺杂浓度对ZnO薄膜的纳米结构和异质结电学性质的影响。

We analyzed the influence of the sputtering time , barometric pressure and iron-doped concentration of ZnO thin films to nano-structured and electrical characteristic of the heterojunction .

采用射频磁控溅射法在有机薄膜衬底上制备出SnO2∶Sb透明导电膜，并对薄膜的结构和光电特性以及制备参数对薄膜性能的影响进行了研究。

Transparent conducting SnO 2 ∶ Sb films are deposited on organic substrates by RF magnetron sputtering .

射频磁控溅射法沉积氮化铜纳米薄膜及PLZT薄膜

The Nano-Cu_3N and PLZT Thin Films Deposited by Radio-frequency Magnetron Sputtering Method

采用直流反应磁控溅射法在玻璃和石英衬底上沉积了ZnO薄膜，然后将它们在H2S气流中硫化得到ZnS薄膜。

ZnS films are produced on the glass and quartz substrates by sulfidation of the as-sputtered ZnO films in the H 2S-H 2-N 2 mixture .

磁控溅射法La（0.5）Ca（0.5）MnxTi（1-x）O3薄膜的制备与结构研究

Preparation and structure of La_ ( 0.5 ) Ca_ ( 0.5 ) Mn_xTi_ ( 1-x ) O_3 thin film deposited by magneto controlled sputtering

采用射频磁控溅射法沉积了CN薄膜，利用XPS，XRD，FTIR等测试手段研究了CN薄膜的成分和结构。

CN films were deposited by radio frequency sputtering technique and the composition and structure of it were investigated by means of XPS , XRD and FTIR .

用磁控溅射法在集成了铂加热电极的Si基膜片型微结构单元上制备了SnO2和SnO2Ag敏感薄膜。

SnO 2 and SnO 2 Ag thin films were prepared by magnetron sputtering on the Si based membrane substrates embedded with a platinum micro heater .

本文使用磁控溅射法沉积GZO透明导电薄膜。

This paper selected magnetron sputtering to prepare GZO thin films .