抛光粉

TCE高性能稀土抛光粉的制备及影响因素的研究

Preparation Method and Technological Condition Effects of TCE Rare Earth Polishing Powder

总结了选择抛光粉、抛光模及配制抛光液的方法：介绍了自行开发的CCOS软件；

The method of choosing polishing powder and polished die and compounding polishing fluid is generalized ; The software of CCOS is introduced ;

碳酸氢铵沉淀法制备CeO2抛光粉

Preparation of CeO_2 as Polishing Powder with NH_4HCO_3 by Precipitation

用粒度仪、SEM、XRD等分析手段对所制得的稀土抛光粉的性能进行了表征。

The some properties of polishes were gotten by using particle analyzer , SEM , XRD and so on , and the results can be referred in the production of polishes to some extent .

制备稀土抛光粉热处理过程中氟的行为

Action of F Heat Treatment of Producing Rare Earth Polishing Powder

稀土抛光粉工艺中新型旋流器设计应用及推广

New type cyclone design and its popularization of RE polishing process

氧化铈抛光粉精密分级控制粒度的研究

Size Control for CeO _2 Polishing Powders by Accurate Classification

铈基抛光粉的制备过程研究

Study on the Preparation of Ceria - based Polishing Powder

以氟碳铈精矿为原料制取稀土抛光粉的研究

A Study on the Preparation of Polishes from Bastnasite

稀土抛光粉颜色的测定及影响因素

Measurement of Color of Rare Earth Polishing Powder and Study of its Factors

氧化铈基抛光粉的制备及性能表征

Preparation and Characterization of Ceria - based Polishing Powders

稀土抛光粉在眼镜玻璃抛光中研磨条件的研究

Study on Condition of Process of Polishing Glasses by Rare Earth Polishing Powder

高铈抛光粉表面电性及悬浮液分散稳定性研究

Study on Surface Electric Properties of Polishing Powder and Dispersible Stability of Suspending Liquid

高性能纯铈抛光粉的制备

Preparation of Ceria Polishing Powder with High Properties

稀土抛光粉的生产及应用现状

Production and Application of Rare Earth Polishing Powder

混合稀土抛光粉的抛光能力和化学活性的关系

Relationship Between Polishing Ability and Chemical Activity of Mixed Rare & earth Polishing Powder

以氯化稀土为原料制备稀土抛光粉的研究

Preparation of RE Polishes From RE Chloride

稀土抛光粉研磨试验研究

Experiment study on RE polishing powder grinding

说明：富铈氧化稀土为黄褐色粉末，用于生产抛光粉。

Describtion : Ce-Rich-Re Oxide is a yellow-brown powder , it is used to produce polish powder .

抛光粉颗粒度对高功率激光玻璃材料抛光效率和粗糙度的影响

Influence of Slurry Particle Size on Materials Removal Rate and Roughness in High Power Laser Glass Material Polishing

铈基抛光粉的抛光性能是由于其特殊的物理化学性质决定的，而如何制备出性能优异的抛光粉，已经成为一项热门的研究课题。

The polishing performance of ceria - based polishing powder is determined by its special physical and chemical property .

切勿使用任何类型的沙布，抛光粉或如酒精，汽油等溶剂进行清洁。

Do not use any type of abrasive pad , scouring powder or solvent such as alcohol or benzine .

以微山氟碳铈精矿为原料，研究了预处理、焙烧、淬火等工艺条件对制备稀土抛光粉性能的影响。

The technological conditions of preparing polishes from bastnasite such as pretreating with hydrochloride acid , roasting and quenching were studied .

公司主要从事稀土产品及抛光粉的研发、是集生产、销售于一体的高科技企业。

The company has its own research and development bases , and production bases in Shangdong , Shanghai and Shanxi province .

通过粒度分析对日本和国内稀土抛光粉的粒度及其分布进行了比较，通过精密分级考察了抛光粉最大颗粒对抛光过程划痕的影响。

The comparison is made for the size distributions of two CeO 2 polishing powders samples from Japan and our country .

抛光粉作用于抛光玻璃表面，其粒度大小及分布特性是影响磨削能力和抛光后玻璃表面粗糙度的重要因素之一。

The size and size distribution of powder is one of the most important factors which affects the efficiency of polishing and the roughness of surface .

以精矿在900℃下焙烧3小时，在炉内自然冷却至300℃后进行淬火制取的稀土抛光粉抛蚀量最大。

The best technological process suggested was that the bastnasite was roasted at 900 ℃ for 3h , cooled to 300 ℃ in the furnace and then quenched .

采用正交试验设计和方差分析的方法，研究了稀土抛光粉抛光眼镜玻璃过程中，中位径、晶粒大小和料浆浓度等因素对抛光过程的影响。

By means of orthogonal test and variance analysis , the effect of granularity , the crystallite size and the concentration of polishing liquid on the polishing process are studied .

随着集成电路对硅基芯片表面质量要求的不断提高以及稀土抛光粉价格不断攀升，寻求新的抛光材料就成为化学机械抛光技术发展的热点。

With the increase of surface quality requirement of silicon substrate for integrated circuits , and the high price of rare earth raw materials , seeking new polishing material is becoming a hot spot of CMP .

铈基抛光粉是一种优秀的抛光材料，它以其独特的抛光性能及质量，广泛的应用于光学玻璃、电子产品等高科技领域。

The ceria-based polishing powder is a kind of most outstanding polishing material . With its unique polishing performance and quality , it is extensively applied to Hi-Tech fields , such as the optical glass , electronic product , etc.