硅化物

用于红外探测的铱硅化物的X射线光电子能谱

X - ray photoelectron spectra of iridium silicide for infrared detection

Ni（Pt）Si硅化物温度稳定性的研究

Investigation on Temperature Stability of Ni ( Pt ) Si Silicide

稀土硅化物合金中PH3气体的逸出行为

Evolution of PH_3 gas from rare earth silicide alloy

Si（001）表面稀土金属硅化物纳米结构

Rare-earth metal silicide nanostructures on Si ( 001 ) surface

含B的硅化物由于形成保护性的硼硅玻璃而具有很好的抗氧化性。

Silicide dopped with boron element has better oxidation resistance property due to the protective film of borosilicate glass .

Ti注入硅合成硅化物层精细结构分析

Analysis for fine structure of synthesis silicides by Ti implantation silicon

离子束混合诱导稀土金属Ce与Si的界面反应及硅化物的形成

Ion-Induced Interface Reaction between Si and Rare-Earth-Metal Ce and the Formation of Silicide

退火气氛中痕量氧在反应形成Pt硅化物中的作用

Effects of Trace Oxygen in Annealing Ambient on Formation of Pt Silicide

La，Ce及Nd稀土金属硅化物的生成

Formation of La , Ce and Nd Rare Earth Metal Silicides on Silicon

镍硅化物生成的TEM原位研究

Study of the formation of nickel silicides " in situ " by TEM

可用于a-Si∶H太阳电池的钛硅化物的研究

Study of Ti Silicide Film Used in a Si ∶ H Solar Cells

Mo3Si-Mo5Si3共晶硅化物的氧化单晶硅化物及其应用

Investigation of the Oxidation of Mo_3Si-Mo_5Si_3 Eutectic Silicide SINGLE-CRYSTAL SILICIDE AND ITS APPLICATIONS

铌硅化物基合金Si-Y2O3共渗涂层的组织形成

Structure formation of Si-Y_2O_3 co-deposition coatings on Nb-silicide-based alloy

铌硅化物基超高温合金包埋渗Si层的组织形成及高温抗氧化性能

Microstructural Formation and High Temperature Oxidation Resistance of Pack Siliconized Coatings on an Nb Silicide Based Alloy

Cr（13）Ni5Si2/γ-Ni三元金属硅化物高温耐磨复合材料

High-temperature sliding wear resistant Cr_ ( 13 ) Ni_5Si_2 / γ - Ni ternary metal silicide composite

（Pt及其硅化物）／硅界面的深能级研究

Study of Deep Level Centers at Pt / Si and Pt-Silicides / Si Interfaces

用于FEA场发射微尖表面的硅化物薄膜

The Silicide Film on the Surface of FEA 's Emission Tips

VLSI中钛硅化物肖特基接触特性与退火条件

Schottky Contact Property and Annealing Condition of Titanium Silicides in VLSI

硅化物与GaAs肖特基接触的快速退火特性

Rapid Thermal Annealing Properties of Silicide GaAs Contact

薄膜全耗尽SOICMOS电路高温特性模拟和结构优化Ge预非晶化硅化物工艺的研究

Ge Pre-Amorphization Silicide Process for Fully-Depleted SOI CMOS Devices

适用于深亚微米CMOS器件的Ni自对准硅化物工艺的研究

The Research of Ni - SALICIDE Process for the Application to Deep Sub - micron CMOS Devices

过渡金属Ni，Pd，Pt硅化物/Si（111）界面的电子态

Electronic States of the Transition Metal ( Ni , Pd , Pt ) Silicides-Silicon ( 111 ) Interfaces

麦秆皮层硅化物的XPS研究（Ⅰ）

Study on the Silicides in Cuticle of Wheat Straw Stem by Means of XPS (ⅰ)

新型Nb硅化物基超高温合金的氧化行为及其抗氧化涂层技术研究

Oxidation Behavior of an Advanced Niobium-Silicide Based Ultrahigh-Temperature Alloy and Preparation of Its Oxidation-Resistant Coatings

进行麦秆皮层硅化物的XPS测定及分峰拟合分析。

The silicides in the cuticle of wheat straw stem were studied by means of XPS-peak-differenating analysis .

退火后利用四探针法测量薄层电阻变化，使用X射线衍射和微区拉曼光谱测量表征硅化物物相变化。

Sheet resistance of the silicide films were measured by four-point probe . X-ray diffraction and micro-Raman spectroscopy were employed to identify the silicide phases .

高温热处理对Nb硅化物基超高温合金组织特征的影响

Effects of High Temperature Heat Treatments on the Microstructure of an Nb Silicide Based Ultrahigh Temperature Alloy

铌硅化物基超高温合金Si-Y2O3共渗涂层的组织及其高温抗氧化性能

Microstructure and High Temperature Oxidation Resistance of Si-Y_2O_3 Co-deposition Coatings Prepared on Nb-silicide-based Ultrahigh Temperature Alloy by Pack Cementation Process

同时，稀土金属硅化物具有较高的电导率，在N型硅上有低的肖特基势垒，而在P型硅上有高的肖特基势垒。

Meanwhile , rare earth silicides also have been studied extensively because of their high conductivity , low Schottky barrier height on n-Si and high Schottky barrier height on p-Si .

采用离子束溅射铁靶的方法在加热的Si（111）衬底上得到了不同种类的铁硅化物。

Different kinds of iron silicides were prepared at different Si ( 111 ) substrate temperatures by ion beam sputtering with an iron target .