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  • tantalum
钽
[tǎn]
  • 一种金属元素。用来制造蒸发器皿等,也可做电子管的电极、整流器、电解、电容。医疗上用来制成薄片或细线,缝补破坏的组织。

  1. SAW级钽酸锂晶体生长

    Growth of the LiTaO_3 Single Crystals for SAW Devices

  2. 含钽光学玻璃的X射线分析

    X-ray analysis of optic glass with TA

  3. ICP-AES测定高纯氧化钽中13种杂质元素

    Determination of 13 Trace Impurities in High-Purity Tantalum Pentoxide by ICP-AES

  4. Excimer紫外灯辐照法钽氧化物膜XPS分析

    XPS Analysis of Tantalum Pentoxide Thin Films Formed by Using Excimer UV Lamp

  5. 目前,钽电容器正向着高压、低ESR的方向发展。

    Currently , high voltage-low ESR is a developing trend of the tantalum capacitor .

  6. 小于2%。H2保护了衬钽管,测定重现性好,衬钽管使用寿命可达650次左右。

    D was less than 2 % , a little amount of H_2 added to Ar kept the tantalum foil-lined tube in good analytical reproducibility .

  7. 钽薄板TIG氦弧点焊熔池的动态测定与分析

    Analysis and dynamic measure of tungsten inert gas spot welding pool for tantalum sheet

  8. 分离基体ICP-AES法测定高纯钽及其氧化物中杂质元素

    Determination of impurity in high purity tantalum and its oxide by ICP-AES after trace-matrix separation

  9. SEM分析结果表明铱钽钛金属氧化物阳极涂层呈现多孔多裂纹形貌结构。

    The SEM results indicated that all coatings were of a porous and cracked_mud microstructure influenced greatly by the composition of coatings .

  10. 讨论分析了烧结型固体钽电解电容器电容量C、损耗tgδ、阻抗Z与使用频率f的关系。

    This paper analyzed the relation that the capacitance , consumption and impedance of a solid tantalum electrolysis capacitor varied with the frequency .

  11. ICP-AES法测定稀土金属中的钛、钼、钨、铌和钽

    Determing Method for Titanium , Molybdenum , Tungsten , Niobium and Tantalum in Rare Earth Metals

  12. 钽薄板小间隙TIG氦弧对接焊熔池形成机理的研究

    Study of forming mechanism of molten pool of TIG helium-arc small-gap butt welding for Tantalum sheet

  13. 这些高比容钽粉基本上能满足于高CV片式固体钽电容器的制作要求。

    These powders are substantially able to meet the requirements of manufacturing high CV chip tantalum solid capacitors .

  14. 公司经营的产品包括贴片二三极管、电容、电阻、钽电容、电感器、IC集成电路等系列。

    YINGXINYUAN devotes to the market development on electronic components such as diodes , triodes , capacitors , resistors , inductors and IC parts .

  15. 退火温度对钽基RuO2·nH2O电沉积薄膜电容性能的影响

    Effect of annealing temperature on capacitance of ruthenium oxide films deposited on tantalum substrate

  16. 对接间隙对钽薄板TIG氦弧焊熔池形态影响的数值分析

    Numerical Analysis of Effect of Butt Gap on Molten Pool Form in TIG Helium-arc Welding of Tantalum Sheet

  17. 渣铁中钽的测定是应用放射性同位素~(182)Ta完成的。

    Contents of Ta in slag and iron were measured by means of radioactive isotope ~ ( 132 ) Ta .

  18. 这些关键应用所考虑的其它因素包括:元件封装设计、工作电源范围和钽器件优异的电容-电压(CV)特性。

    Otherconsiderations for these critical applications include component package design , working voltage ranges and the advantageous CV levelsof tantalum devices .

  19. KOH亚熔盐浸出低品位难分解钽铌矿的实验

    Leaching of a Low - grade Refractory Tantalum - Niobium Ore by KOH Sub - molten Salt

  20. 在新近的MEMS应用中,氮化钽薄膜已经被证实可以用作MEMS微桥结构的电连接材料,但是目前应用于MEMS的氮化钽刻蚀的研究非常少。

    And in recent application , it has been demonstrated that TaN thin film can be used as conductor material for MEMS micro bridge structure .

  21. 电流密度对电沉积制备钽基RuO2·nH2O薄膜形貌的影响

    Effects of Current Density on Adhesion and Morphology of Tantalum-based RuO_2 · nH_2O Film Prepared by Electrodeposition

  22. ULSI铜多层布线中钽阻挡层CMP抛光液的研究与优化

    Study and Optimization of CMP Slurry Used to Tantalum Barrier Layer of Copper Interconnection in ULSI

  23. 氮化钽(Ta2N)热场发射阴极有低、高两种发射状态。

    Ta_2N thermal field ( TE ) emission has been investigated under both I , w and high emission states .

  24. 经EBSD测定了不同状态下钽的织构。

    Textures of different samples were determined by EBSD .

  25. 类镍钽软X射线激光用反射镜是周期多层膜,其膜层厚度小、周期数多,制备难度大,实际反射率远小于设计值。

    The high reflective mirrors for Ni-like Ta soft X-ray laser are periodical multilayers , whose layer thickness is small and the period number is large , which make them extremely difficult to fabricate .

  26. 咨询机构MerchantResearch&Consulting称,钽的主要开采地包括巴西(26%)、澳大利亚(12%)以及莫桑比克(17%)等国家。

    Brazil ( 26 % ) , Australia ( 12 % ) , and Mozambique ( 17 % ) , according to merchant Research & consulting .

  27. 高压(160V)低ESR液体钽电容器工作电解质的研究

    Study of Working Electrolyte of High Voltage ( 160V ) Low ESR Wet Tantalum Capacitors

  28. 铌(V)和钽(V)的过氧络合物在分析化学中的应用Ⅰ.酒石酸对利用Ta(V)-H2O2-PAR三元络合物直接分光光度测定钽的影响

    Applications of niobium (ⅴ) and tantalum (ⅴ) peroxide complex in analytical chemistry ⅰ . the effect of tartaric acid on direct spectrophotometric determination of tantalum via ternary TA (ⅴ) - h_2o_2-par complex

  29. 钽薄壁管GTA焊接接头晶粒细化机理

    Grain refinement mechanism of gas tungsten arc welded joint of tantalum thin walled tube

  30. 目前的文献均表明钽镁酸钡Ba(Mg1/3Ta2/3)O3不易获得单一物相。

    The single phase is not easy acquired in Ba ( Mg1 / 3Ta2 / 3 ) O3 as the papers so far have showed .