阴极溅射

Ni-Cr-Mo-Nb合金的阴极溅射行为

Cathode sputtering behavior of Ni-Cr-Mo-Nb alloy

多重空心阴极溅射靶及其应用

Research of Multiple Hollow Cathode Sputtering Target and Its Application

阴极溅射SiC涂层碳纤维结构与特性研究

Structure and mechanical properties of SiC coated fibres by PVD

真空蒸发、阴极溅射、分子束外延等属于物理淀积。

Vacuum evaporation , cathode sputtering , molecular beam epitaxy , is physical deposition .

阴极溅射原子化器在合金分析中的应用

A Cathodic Sputtering Atomizer and Its Application to Direct Analysis of Metals and Alloys

氦-氖激光管中阴极溅射造成气体清除规律的实验研究

Experimental investigation on the clearing law of operational gas by cathode-sputtering in He-Ne lasers

铜阴极溅射辉光放电在强短脉冲供电时的发射光谱研究

Study of Copper Cathode Sputtering Glow Discharge Operated by High Current and Microsecond Pulsed Mode

研究了双层辉光放电条件下镍基合金Inconel625的阴极溅射行为。

The cathode sputtering of nickel base alloy Inconel 625 was studied in double glow discharge .

辉光放电、阴极溅射／瞬变原子化原子吸收光谱中阴极材料的研究

Studies on Cathode Materials by Cathodic Sputtering in a Glow Discharge-Atomic Absorption Spectrometry Having Transient Mode of Atomization

它具有工作气压高，维持电压低，阴极溅射率高等特点。

It has the characteristic of working on higher pressure and lower voltage and having a high cathode sputtering rate .

本文研究了辉光放电离子轰击钎焊时阴极溅射现象对工件表面的净化作用。

The surface cleaning action , caused by the cathode sputtering phenomenon in ion bombardment brazing in glow discharge is investigated in this paper .

激光陀螺仪失效机理非常复杂，其中对寿命影响最为重要的因素是阴极溅射和反射镜的污染及损伤。

The failure mechanisms of the RLG are very complex , but the cathode sputtering and the polluting of the reflector are the most important factors among them .

辉光放电、石墨阴极溅射/瞬变原子化原子吸收光谱测定镉、铬、铜、铁、镁、锰的研究

Determination of Cadmium , Chromium , Copper , Iron , Magnesium and Manganese by Graphite Cathode Sputtering in a Glow Discharge-Atomic Absorption Spectrometry Having Transient Mode of Atomization

该设备的独到之处在于采用了一种新的固态原子化技术，有机结合了辉光放电与阴极溅射技术，实现了固体直接进样。

The innovation of the equipment lies on the fact that a novel solid-state atomization technique is adopted . This innovative approach well combined with technologies of glow discharge and catholic spray realizes the direct analysis of solid samples .

与直流放电相比较，射频放电具有激励电压低、效率高、易于快速调制、无阴极溅射、比输出功率高、寿命长、多个波导可共用激励电源、结构紧凑等诸多优点。

Compared to DC discharge , RF discharge has many advantages , such as low exciting voltage , high efficiency , capable of high speed modulation , no cathode sputtering , high output power , long life , power supply for multi-waveguides , compactness , etc.

采用阴极磁控溅射法，在不同基片温度（180～300℃）条件下镀覆铟锡氧化物（ITO）透明导电膜。

Indium tin oxide ( ITO ) films were deposited onto glass substrates at different substrate temperatures ( 180 & 300 ℃) by DC reactive magnetron sputtering method .

对向平面双阴极磁控溅射装置及超硬涂层研究

Equipment of Magnetron Sputtering with Opposite Double Plane Cathodes and Study on Super-hardness Coated Layer

通过空心阴极的溅射作用，在烧结体表面能够形成完整的钨渗层；

By splashing of hollow cathode , whole tungsten alloying layer can be formed on the surface .

给出了金属靶阴极表面溅射清洗效果的伏安特性评价法，为克服“靶中毒”提供了有效的技术途径。

The evaluating method of sputtering cleanout effect on metal target surface by volt-ampere characteristic of target cathode has been given , which provides effective approach to eliminate " target poisoning " .

在磁控管阴极上溅射催化剂生长了碳纳米管，场发射测试结果表明，在较小的电压下就可以测到发射电流，电流最大能达到1.3mA，计算了其场增因子，为1.3×104。

Field emission of carbon nanotube was grown on the cathode of magnetron has been investigated . The emission current was measured in low voltage corresponding to a field-enhancement factor of about 1.3 × 10 ~ 4 .

用于场发射阴极的磁控溅射金刚石薄膜的研究

The Study of Dimond Megnetron Sputtering Film for the use of Field Emission Cathode

空心阴极放电的阴极溅射分析

Cathode Sputtering in a DC Hollow Cathode Discharge

液晶显示器制造工艺中的降低反射层、透明电极、发射极与阴极等均由溅射方法形成。

Reducing reflecting layer , transparent electrode , emitter and cathode in the LCD manufacturing technology are all carried out using sputtering method .

一种半圆柱磁控溅射阴极，属于磁控溅射装置中的溅射源部件。

The utility model relates to a semi-circular column magnetic control sputtering cathode , belonging to a sputtering source component of a magnetron sputtering device .

空心阴极直流放电的二维自洽模型描述和阴极溅射分析

Self-consistent description of a DC hollow cathode discharge and analysis of cathode sputtering