亚阈值电流
- 网络Subthreshold Current
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短沟道MOSFET亚阈值电流的解析模型
Analytical Model of Subthreshold Current for Short Channel MOSFET
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先对其进行理论上的计算分析,得到亚阈值电流,阈值电压,饱和电流等随温度的变化关系,并用Medici模拟仿真进行验证。
Its first theoretical calculation and analysis , sub-threshold current , threshold voltage , saturation current variation with temperature , and the Medici simulation verification .
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他们对MOS晶体管的阈值电压、表面载流子的迁移率、亚阈值电流、漏源电流、泄漏电流等参数在25℃~300℃环境下的变化情况给出了高温电学特性方程和经验公式。
They have given out several experiential formulae and equations of high-temperature electrical characteristics about the threshold voltage , surface mobility of carriers , sub-threshold current , drain current and leakage current variations under 25 ~ 300 ℃ .
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这些氧化层电子陷阱俘获电子后带负电,引起阈值电压增大、亚阈值电流减小。
The threshold voltage would increase and the sub-threshold current would decrease when the injected electrons are trapped by the electron traps .
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针对应用要求,设计了一个环形振荡器,分析了影响振荡频率精度、输出波形及噪声的因素,并设计了一个无电阻的亚阈值电流偏置电路。
Factors that affect the oscillator frequency precision , output wave form and noise are analyzed in detail , and a weak inversion current bias circuit without resistors is designed .
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分析认为雪崩热空穴注入栅氧化层,会产生界面态和大量中性电子陷阱,引起阈值电压增大、亚阈值电流减小。
The results show that when the avalanche hot holes inject into oxide , interface states and neutral electron traps are generated , and then threshold voltage increases and sub-threshold current decreases .
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关态漏泄漏电流的退化分两个阶段:第一阶段亚阈值电流是主要成分,第二阶段栅电流是主要成分。
The degradation of drain leakage current can be divided into two phases . Sub-threshold current is predominant in the first phase , while in the second phase gate current is predominant .
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就不同边缘注入剂量对H型栅SOIpMOSFETs亚阈值泄漏电流的影响进行了研究。
The research on the influence of edge implant on subthreshold leakage current of H-gate SOI pMOSFETs doses was made .
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其中动态功耗包括开关功耗和内部功耗,静态功耗的主要来源为亚阈值泄漏电流。
The power source contains dynamic power and static power , the dynamic power contains switch power and internal power , meanwhile the sub-threshold leakage current is the main source of the static power .
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此电路采用工作于亚阈值区的峰值电流镜,构成自偏置电路,具有非常高的电源抑制比和温度稳定性,非常适合现代低电压低功耗的应用,而且非常适合当今的IC工艺。
It applies MOS peaking current mirror working in subthreshold region to construct a self-biasing circuit and has great rejection to power variation and has strong stability for temperature . This circuit is also suitable for today 's IC process .
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直接从亚阈值MOSFET漏源电流(即亚阈值电流)的方程中,得到亚阈值MOSFET栅源电压表达式,并分析其温度特性。
From the quoted equation for the current between source and drain Ids of the sub-threshold MOSFET , the expression for the voltage between gate and source drain Vgs of the sub-threshold MOSFET is directly got and the temperature characteristic of Vgs is theoretically analyzed .