离子注入机

IGBT在离子注入机中的应用问题

The application of IGBT in ion implanter

一台离子注入机的改进及其在BaTiO3陶瓷改性中的应用

A improved ion implanter and its application in the modification of batio_3 ceramics

论文首先考虑沟道效应，建立了离子注入机的设备模型，用VISUALBASIC编程实现了硅片表面离子注入工艺结果的分布图。

A equipment model of ion implant which thinks over the channel effects is established in This paper and it displays ion implant process result on silicon chip with Visual Basic programming .

通过PC-PLC实现的复合离子注入机实时监控

The Compound Ion Implanter Control System Based on the PC-PLC

采用无质量分析器的离子注入机，以低能量低剂量注水的方式代替常规SIMOX注氧制备SOI材料。

An implanter without ion mass analyzer was used to fabricate thin SOI materials by low energy and low dose water ions implantation instead of conventional SIMOX .

利用金属蒸汽真空弧（MEVVA）源离子注入机在溶胶凝胶法制备的TiO2薄膜上注入V+。

TiO_ ( 2 ) photocatalytic films produced by the sol-gel method are modified by vanadium ion implantation using metal vapor vacuum arc ( MEVVA ) implantor .

LC3型离子注入机的研制和应用

Development and Application of LC 3 Ion Implanter

介绍了SOI技术的特点和制造方法、超薄SOI技术，应变硅SOI技术及其设备，如大束流专用氧离子注入机。

In this paper , the characteristics and manufacturing method of SOI technology , ultra-thin SOI technology , strained silicon SOI technology and its equipment such as big beam flow private oxygen ion injecting equipment are introduced .

离子注入机靶室尘埃污染与系统改造

Particle Contamination and System Reformation in End Station of Ion Implanter

强流离子注入机加速管的聚焦特性研究

Study on focusing characteristic of acceleration tube in high current implanter

LC-11型强流离子注入机晶片电荷积累效应分析

Analysis on wafer charging in LC 11 high current ion implanter

大束流离子注入机能量污染的研究

A Study of the Energy Contamination of Large Beam Ion Implanter

四电极和五电极离子注入机的离子光学

Ion optics of ion implanters with four or five electrodes

全机械扫描强流离子注入机重复性研究

Study on reproducibility of high current ion implanter with full mechanical scan

离子注入机真空系统特性研究

Studies on the Characteristic of Vacuum - pumping for the Ion Implanter

强流氧离子注入机注入均匀性分析及提高

Uniformity Analysis and Enhancement for Implantation of High-current Oxygen Implanter

离子注入机的国内外现状

The present conditions of internal and external ion implanters

一台400keV离子注入机的光路设计

Ion optics design of a 400 keV ion implanter

大角度离子注入机控制系统的研制

Design of the Large Tilt Ion Implanter Control System

离子注入机高压上的电器的光控调节

The photoelectric control of the Power on high Voltage for the ion Implantation System

CG&60离子注入机及应用

CG ─ 60 Ion Implantor and Its Application

离子注入机的接受相图分析

Acceptance diagram analysis of the ion implanter

离子注入机的计算机控制扫描系统

Computer control scanning system for ion implanter

带后加速离子注入机的物理图象和参数关系

Relation between the Physics Images and Parameter of the Ion Implanters with the Post Acceleration

在线离子注入机质量跟踪研究

Quality Tracking of an In-Line Ion Implanter

SC&50型金属工艺用离子注入机的离子源、加速管及靶室

The ion source acceleration system and target chamber of the SC-50 ion implanter for metal technology

用于强流离子注入机的磁分析器电源设计

Design of highly stable and reliable power supply for analyzer of high - current ion implanter

GB/T15862-1995离子注入机通用技术条件

Generic specification for ion implantation equipment

简单介绍了典型离子注入机的组成，分析了离子注入机中扫描技术的重要性。

Introduced the configuration of typical ion implanter , analyzed the importance of the implantation mechanical scanning technology .

束流纹波对全机械扫描离子注入机重复性的影响

The Effect of Ion Beam Current Ripple on the Reproducibility of High Current Ion Implanter With Full Mechanical Scan