物理气相沉积

物理气相沉积镀渗新工艺

New PVD coating & diffusing technique

多弧物理气相沉积技术制备（TiAl）N超硬膜

Super acids development of ( tial ) n Advanced Films by PVD arc process

物理气相沉积TiN多元涂层和多层涂层的研究进展

Research Development of Physical Vapor Deposition TiN Multi-Component Coating and Multilayer Coating

物理气相沉积TiN复合涂层研究进展

Research Development of the TiN PVD Composite Coa tin gs

物理气相沉积TiN涂层结合力的研究现状与展望

Research and Prospect on Binding Force for PVD TiN Coating

激光物理气相沉积Al2O3薄膜

Laser Physical Vapour Deposition of Al_2O_3 Film

物理气相沉积TiN薄膜疲劳磨损形貌的AFM观测

AFM Observation of Fatigue Surface Images of TiN Thin Films by Physical Vapor Deposition

对M3滚刀进行了物理气相沉积（PVD）工艺试验。

The technology test of PVD is used on M3 hob .

每组不锈钢边框都通过物理气相沉积法处理，打造出Apple定制的外观，优雅精致且抗磨损和腐蚀。

Each band goes through a physical vapor deposition process to create an Apple-custom finish that is so elegant , yet incredibly resistant to abrasion and corrosion .

现场试验结果表明，经采用物理气相沉积技术进行TiN涂层处理后，钻井泵泵阀使用寿命较未采用这项技术处理前提高了将近3倍。

The result of field test shows that the service life of the drill pump valve treated with TiN coating Increases by three times .

利用物理气相沉积（PVD）真空蒸镀法，研究铬钛合金装饰膜。

Vacuum evaporated film of Ti-Cr alloy has been studied .

简要地评述了化学气相沉积（CVD）、物理气相沉积（PVD）、表面改性技术和其它表面处理技术的新进展。

New advance in chemical vapour deposition ( CVD ) , physical vapour deposition ( PVD ) .

采用物理气相沉积工艺在高速钢表面沉积TiN薄膜，研究了TiN薄膜的疲劳磨损过程。

Fatigue wear performance of TiN hard coating on the surface of high speed steel ( HSS ) by ion sputtering deposition process was investigated using atomic force microscope .

采用物理气相沉积（PVD）与阳极氧化与电沉积相结合的复合技术在Si基表面制备了羟基磷灰石（HA）/Al2O3复合生物涂层。

The bioactive coating of hydroxyapatite / Al_2O_3 on Si substrate was fabricated by a hybrid technique of physical vapor deposition ( PVD ), anodization and electro-deposition .

介绍了物理气相沉积氮化钛（PVD）涂层工艺及在工具表面处理中的应用。

This paper presents the technology of Tin plating by physical gas-phase sedimentation and its application in tool plating .

本论文是利用多种物理气相沉积方法制备具有高TCR红外探测器用氧化钒薄膜的研究。

In this thesis , three vapour deposition techniques are adopted to prepare vanadium oxide thin films with high TCR for uncooled IR detectors .

目的：研究两种表面处理（等离子渗氮和物理气相沉积TiN涂层）对钛、钛合金表面的组织结构、性能及对变形链球菌粘附的影响。

Objective : To investigate the effect of two different surface treatments to pure titanium and its alloy discs on their surface structure and property , and on Streptococcus mutans adhesion in comparison with control surfaces of equivalent roughness .

着重讨论了δ-TiN的非化学计量性和物理气相沉积过程非平衡性对于Ti-N系膜相组成的影响。

The influences of nonstoichiometry of δ - TiN and phase composition of Ti-N system films are emphasized .

采用物理气相沉积（PVD）方法在PI基板上沉积Cu薄膜，利用TiN陶瓷薄膜阻挡Cu向PI基板内部扩散。

Copper thin films were deposited on PI substrates by physical vapor deposition ( PVD ) method . Amorphous TiN film with thickness of 150 nm prepared by PVD was used as a diffusion barrier between Cu on PI .

利用物理气相沉积（PVD）方法在316L不锈钢表面分别镀制微米量级厚的TiN+TiC+TiN、TiN+TiC+SiO2复合膜。

The films of TiN + TiC + TiN and TiN + TiC + SiO 2 were deposited on the surface of 316L stainless steel by physical vapor deposition technology .

综述了化学气相沉积（CVD）和物理气相沉积（PVD）工艺的特点与开发，以及CVD和PVD镀层及金刚石镀层刀具的性能和应用。

In this paper , the characters and development of CVD and PVD process , and the performance and application of commonly used CVD , PVD coated and diamond-coated cutting tools have been summarized .

涂层的化学气相沉积（CVD）和表面层改性的物理气相沉积（PVD）涂层的离子注入，所有三个正在受到考验，并部分使用。

Coating by physical vapour deposition ( PVD ), coating by chemical vapour deposition ( CVD ) and surface layer modification by ion implantation , all three are being tested and are partly in use .

本文介绍了如何利用物理气相沉积的技术制备并五苯晶体薄膜，并且进一步制备有机物并五苯场效应晶体管（OTFT）的方法。

Methods of preparation of pentacene thin film by PVD and pentacene field effect transistor are reported .

为了得到质量较好的Fe-C合金膜，在石英玻璃上探索了多种成膜方法：PVD法（物理气相沉积）和电镀法等。

Many methods , such as PVD ( Physical Vacuum Deposit ), electroplating , etc , have been explored on quartz glass in order to form aFe-C alloy film with better quality .

采用物理气相沉积法在RAINBOW压电陶瓷上沉积了形状记忆合金膜，分析了不同制备工艺对膜层的影响，优化了工艺参数。

The shape memory alloy ( SMA ) was deposited on the RAINBOW piezoelectric ceramics by physical vapor deposition ( PVD ) method . The influence of fabrication process on the film was analyzed and the optimal fabrication parameters were studied .

本文采用电子束物理气相沉积（EB-PVD）技术制备了用于固体氧化物燃料电池（SOFC）的Ni-YSZ阳极涂层及YSZ电解质涂层材料。

Electron beam physical vapor deposition ( EB-PVD ) technique was employed to prepare the Ni-YSZ anode coatings as well as the YSZ electrolyte coatings for SOFCs in this study .

通过控制加热温度，采用物理气相沉积（PVD）技术制备了新型有机非线性光学材料L-苹果酸脲（ULMA）的晶体薄膜，该薄膜保持了晶体良好的非线性光学性质。

A new nonlinear optical material urea L_malic acid film ( ULMA ) was successfully prepared by physical vapour deposition ( PVD ) at appropriate heating temperature .

在我们的CHEACO产品计划你会找到一个适合的物理气相沉积氧化物广泛。

In our CHEACO product program you will find a wide range of oxides suited for physical vapor deposition .

评述了热障涂层发展的现状，研究了电子束物理气相沉积（EB-PVD）热障涂层的恒温氧化和循环氧化行为。

The developed status of thermal barrier coating was reviewed , and isothermal and thermally cyclic oxidations of EB-PVD ( electron beam physical vapor deposited ) thermal barrier coatings ( TBC ) were performed .

用电子束物理气相沉积方法（EB-PVD）制备了双层结构热障涂层，对其在热循环过程中的组织结构变化与失效模式用扫描电镜（SEM）与交流阻抗法进行了测试分析。

Two layered structure thermal barrier coatings were prepared by electron beam physical vapor deposition . The changes on microstructure and the failure mode of the specimen during thermal cyclic oxidation were analyzed by scanning electron microscopy ( SEM ) and impedance spectroscopy ( IS ) .